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Photoresist & Polymers
Our negative photoresists are used for UV-, DUV, e-beam and X-ray lithography as well as for laser direct writing …
Our positive photoresists are used in UV lithography (mask aligner, laser direct writing, greyscale exposure)…
Our UV-curable hybrid polymers are used for the manufacture of polymerbased micro-and nano-optics …
Our tailor-made resist formulations are used in different technologies of nanoimprint lithography(NIL) …
Our inkjet materials from all product groups are suitable in highly diverse applications using inkjet printing processes …
Our dry film resists are used as a permanent material in optical applications and micro fluidics …
Developers, Removers & Adhesion Promoter...
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