Photonics
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Process solutions for InP InGaAs InAlAs
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Direct Write Lithography with high-performance Grayscale enables the precise manufacturing of Variable Line Spacing and standard gratings.
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With Two-Photon Polymerization technique of MPO 100 system, individual micro-lenses or arrays can be fabricated directly on photonic chips, substrates, or optical fibers for endoscopic devices for in- and outcoupling purposes.
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High resolution associated with grayscale lithography capabilities of NanoFrazor systems make it ideal for fabricating nano-optical structures such as diffraction gratings, optical Fourier surfaces, phase plates and more intricate finely tuned optical components.
ATLANT 3D’s capabilities in optics, photonics, and novel displays are rooted in its innovative technology and dedication to quality and precision using DALP Technology:
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Customizable Layering and Patterning
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Material Adaptability
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Integration with Existing Technologiesto integrate seamlessly with existing manufacturing processes, facilitating a smooth transition to advanced optoelectronic fabrication.
Manipulation of light often requires sub-wavelength patterning capabilities in all three dimensions. With the NanoFrazor tool and the Closed Loop Lithography (CLL) capability, new landscapes such as optical Fourier surfaces are made into possible. Large area requirements for nanophotonic applications are now also possible with the Decapede module where ten t-SPL cantilevers operate in parallel for increased throughput with sub-30nm resolution.
