NanoFrazor Nanolithograthy
The versatile and modular nanolithography tool
The NanoFrazor is a groundbreaking commercial system for Thermal Scanning Probe Lithography (t-SPL), designed to enable advanced research and innovation across diverse applications. Whether exploring quantum devices, 1D/2D materials, quantum dots, Josephson junctions, or nanoscale device arrays, the NanoFrazor provides unparalleled precision and versatility. Its capabilities extend to complex challenges, including grayscale photonics, nanofluidic structures, biomimetic substrates for cell growth, and local material modification through heat-driven chemical reactions or physical phase changes.
Key Features
High-Resolution Nanopatterning: At the heart of the NanoFrazor lies an ultra-sharp, heatable probe tip that enables simultaneous writing and inspection of complex nanostructures. Self-correcting patterning is powered through the Closed-Loop Lithography (CLL) capability. This innovative design delivers unmatched precision for creating intricate patterns and structures.
Direct Laser Sublimation (DLS) Module: The DLS module streamlines fabrication by allowing nano- and micro-structures to be written efficiently into the same resist layer in a single step. This integration simplifies workflows and enhances productivity.
In-Situ Imaging with Markerless Overlay: The NanoFrazor’s in-situ imaging technology introduces markerless overlay and real-time comparison of written and target patterns. This unique Closed-Loop Lithography (CLL) capability ensures sub-2 nm vertical precision for creating complex 2.5D (grayscale) shapes and allows immediate parameter adjustments during the writing process.
Parallel Writing with 10 Tips: The Decapede feature enables parallel writing with 10 heatable tips, significantly increasing throughput while maintaining the NanoFrazor’s renowned precision. This capability is ideal for large-area patterning and time-sensitive applications.
Modular and Upgradable Design: The NanoFrazor’s modular platform allows for extensive customization to meet specific research needs and laboratory environments. Patterning modes, housing options, and software modules can be tailored for maximum flexibility and functionality. As research evolves, the NanoFrazor can be upgraded with additional modules, ensuring its long-term adaptability.
Comprehensive Process Support: With over 20 years of research and development at IBM Research Zürich and Heidelberg Instruments Nano, the NanoFrazor user community benefits from continual advancements in hardware and software. Users gain access to a comprehensive library of best practices and protocols for pattern transfer processes like etching and lift-off, ensuring optimal results for various applications.
The NanoFrazor revolutionizes nanofabrication by making sophisticated Thermal Scanning Probe Lithography accessible to researchers and technologists worldwide. Its cutting-edge features, modular design, and extensive application range position it as an indispensable tool for groundbreaking research and technological advancements.
Applications
Quantum Devices: Create precise nanostructures for quantum computing and advanced electronic applications.
1D/2D Materials: Pattern and modify nanostructures on graphene, transition metal dichalcogenides, and other 2D materials.
Photonics: Achieve sub-2 nm vertical precision for grayscale shapes like sinewave gratings and phase plates in optical systems.
Biotechnology: Develop biomimetic substrates for cell growth and create nanofluidic structures for biological and chemical analysis.
Local Material Modification: Enable localized heat-driven processes such as chemical reactions and phase changes for innovative research in material science.
Customer applications
Electrical contacts to an InSb nanowire were fabricated using markerless overlay with the NanoFrazor. The nanowire was first precisely located using the integrated topography sensor, before the electrode design was overlaid and patterned. In order to protect the nanowire from damage, areas directly on the nanowire were patterned exclusively with t-SPL.
Fabricating full devices to investigate and exploit transition metal dichalcogenides is typically very challenging, due to the environmental sensitivity of these materials. With the NanoFrazor, electrodes were overlaid and patterned without the need to expose the underlying flakes to a harsh environment.
Manipulation of light often requires sub-wavelength patterning capabilities in all three dimensions. With the NanoFrazor tool and the Closed Loop Lithography (CLL) capability, new landscapes such as optical Fourier surfaces are made possible. Large area requirements for nanophotonic applications are now also possible with the Decapede module where ten t-SPL cantilevers operate in parallel for increased throughput with sub-30 nm resolution.
Why customers choose our systems
"I enjoy the closed-loop lithography feature that NanoFrazor offers, which is very helpful in high precision lithography, overlay and stitching for the various applications in low dimensional material applications. Also I appreciate the prompt and professional responses (within 24 hours) from the NanoFrazor support team regarding all aspects of our needs in using the system."
Xiaorui Zheng, Assistant Professor, Principal Investigator
Westlake University, Hangzhou, China
Technical Data
Patterning performance | Thermal Probe Writing(Single Tip) | --(Decapede) |
|---|---|---|
Minimum structure size [nm] | 15 | 15 |
Minimum Lines and Spaces [half pitch, nm] | 25 | 25 |
Grayscale / 3D-resolution (step size in PPA) [nm] | 2 | 2 |
Maximum writing field size [X μm x Y μm] | 60 x 60 | 60 x 60 |
Field stitching accuracy (markerless, using in-situ imaging) [nm] | 25 | 25 |
Overlay accuracy (markerless, using in-situ imaging) [nm] | 25 | 25 |
Write speed (typical scan speed) [mm/s] | 1 | 1 |
Write speed (50 nm pixel) [μm²/min] | 1000 | 10000 |
System features | -- |
|---|---|
Light source | Diode lasers: 8 W at 405 nm, 2.8 W at 375 nm, or both |
Substrate sizes | Variable: 3 x 3 mm² to 6″ x 6″ | Optional: 8″ x 8″ Customizable on request |
Substrate thickness | 0 - 12 mm |
Maximum exposure area | 150 x 150 mm² | Optional: 200 x 200 mm² |
Temperature controlled flow box | Temperature stability ± 0.1 °C |
Real-time autofocus | Air-gauge or optical |
Autofocus compensation range | 180 μm |
Grayscale | 128 gray levels |
Software features | Exposure wizard, resist database, automatic labeling and serialization, Draw Mode for CADless exposures, substrate tracking / history |
System dimensions (lithography unit) | -- |
|---|---|
Weight | 1100 kg |
Height × width × depth | 1950 mm × 1300 mm × 1300 mm |
Optional system features / modularity | -- |
|---|---|
Direct laser sublimation | Laser source and optics: 405 nm wavelength CW fiber laser, 300 mW, 1.2 μm minimum focal spot size Laser autofocus: Using the distance sensor of the NanoFrazor cantilever |
Decapede | Parallel writing with 10 tips |
Standalone housing | Three-layer acoustic isolation, superior vibration isolation (> 98% @ 10 Hz) | PC-controlled temperature and humidity monitoring, gas-flow regulation | (Dimension 185 cm x 78 cm x 128 cm / weight 650 kg) |
Full glovebox integration | Integration in glovebox available for nanolithography in a controlled environment |
NanoFrazor cantilever features (both Single Tip and Decapede) | -- |
|---|---|
Tip geometry | Conical tip with <10 nm radius and 750 nm length |
Tip heater temperature range | 25 °C – 1400 °C (<1 K setpoint resolution) |
Integrated components | Tip heater, topography sensor, electrostatic actuation |
Base system dimensions & installation requirements | -- |
|---|---|
Height × width × depth | Table-top unit: 44 cm x 40 cm x 45 cm
Controller: 84 cm x 60 cm x 56 cm |
Weight | Table-top unit: 50 kg
Controller: 80 kg |
Power input | 1 x 110 or 220 V AC, 10 A |
Software features |
|---|
GDS and bitmap import, 256 grayscale levels, topography image analysis and drawing for overlay, mix & match between tip and laser writing, fully automated calibration routines, Python scripting |
